Systematic investigation of the properties of TiO 2 films grown by reactive ion beam sputter deposition
Systematic investigation of the properties of TiO 2 films grown by reactive ion beam sputter deposition
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DOI：
10.1016/j.apsusc.2016.08.056
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发表时间：
2017-11
影响因子：
6.7
通讯作者：
C. Bundesmann;T. Lautenschläger;D. Spemann;A. Finzel;E. Thelander;M. Mensing;F. Frost
中科院分区：
文献类型：
--
作者：
C. Bundesmann;T. Lautenschläger;D. Spemann;A. Finzel;E. Thelander;M. Mensing;F. Frost
采用离子束溅射沉积方法，系统地改变了离子束参数(离子种类、离子能量)和几何参数(离子入射角、极发射角)，并对薄膜厚度、生长速率、结构特性、表面形貌、成分、光学性质和质量密度进行了表征。薄膜厚度和生长速率的角分布呈向前倾斜的超余弦形状。所有薄膜均为非晶态，表面粗糙度均小于0.22 nm。成分分析表明，纳米二氧化钛具有化学计量比的背向散射初级粒子。用Tauc-Lorentz(TL)模型分析了其光学性质。热释光模型的幅值参数随散射角的变化是系统的，而对其他热释光参数的影响可以忽略不计。质量密度与光学性质遵循相同的趋势，即光学性质和质量密度是相关的。表面粗糙度、注入一次粒子的原子分数、光学性质和质量密度随工艺参数呈现出相似的系统变化，尤其是随散射几何形状(即散射角)的变化。离子种类、离子能量和离子入射角没有或只有很小的影响。薄膜性质的变化暂时归因于溅射的靶粒子和背向散射的初级粒子的角度和能量分布的变化。
TiO2films were grown by ion beam sputter deposition under systematic variation of ion beam parameters (ion species, ion energy) and geometrical parameters (ion incidence angle, polar emission angle) and characterized with respect to film thickness, growth rate, structural properties, surface topography, composition, optical properties, and mass density. The angular distributions of film thickness and growth rate show an over-cosine shape, which is tilted in forward direction. All films are amorphous and the surface roughness is below 0.22 nm. The investigation of the composition revealed stoichiometric TiO2with implanted backscattered primary particles. The optical properties were analysed using the Tauc Lorentz (TL) model. The amplitude parameter of the TL model was found to vary systematically with the scattering angle, whereas the impact on the other TL parameters is negligible. Mass density follows the same trends as the optical properties, i.e. optical properties and mass density are correlated. Surface roughness, atomic fraction of implanted primary particles, optical properties and mass density show similar systematic variations with process parameters, especially, with the scattering geometry (i.e. scattering angle). Ion species, ion energy and ion incidence angle have no or only a small impact. The variations in the film properties are tentatively assigned to changes in the angular and energy distribution of the sputtered target particles and backscattered primary particles.