Nanochannel fabrication for chemical sensors
Nanochannel fabrication for chemical sensors
复制标题
DOI：
10.1116/1.589750
复制
发表时间：
1997-11
影响因子：
1.4
通讯作者：
M. Stern;M. Geis;Jane E. Curtin
中科院分区：
文献类型：
--
作者：
M. Stern;M. Geis;Jane E. Curtin
在一种新型的化学传感器--化学电荷耦合器件（CCD）中，小于德拜长度的纳米毛细管通道中的静电场将用于分离和浓缩溶液中的离子，预测检测限<1× 10−13 M。传统的集成电路技术用于在Si衬底上存款薄的介电和非晶Si膜，并光刻地限定沟道和贮存器结构。采用四甲基氢氧化铵湿法腐蚀非晶Si牺牲层，制备了高度为20 ~ 100 nm，宽度为0.5 ~ 20 μm，长度为5 mm的Si 3 N4空心纳米通道.初始建模的三相化学CCD预测的能力，选择和浓缩离子成分的许多数量级，根据他们的扩散系数。
In a novel chemical sensor, the chemical charge coupled device (CCD), electrostatic fields in nanocapillary channels smaller than a Debye length will be used to separate and concentrate ions in solution with a predicted detection limit of <1× 10−13 M. Conventional integrated circuit techniques are used to deposit thin dielectric and amorphous-Si films on a Si substrate and to lithographically define channel and reservoir structures. Hollow Si3N4 nanochannels with heights between 20 and 100 nm, widths between 0.5 and 20 μm, and lengths up to 5 mm have been fabricated by wet chemical etching of a sacrificial amorphous-Si layer in tetramethylammonium hydroxide. Initial modeling of a three-phase chemical CCD predicts the ability to select and concentrate ionic constituents by many orders of magnitude, according to their diffusion coefficients.