Formation mechanism of a microscale domain and effect on transport properties in strained VO2 thin films on TiO2(001)
Formation mechanism of a microscale domain and effect on transport properties in strained VO2 thin films on TiO2(001)
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DOI:
10.1103/physrevb.90.054203
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发表时间:
2014-08-11
影响因子:
3.7
通讯作者:
Tanaka, Hidekazu
中科院分区:
文献类型:
--
作者:
Kawatani, Kenichi;Kanki, Teruo;Tanaka, Hidekazu
We investigated film thickness dependence of domain size and transport property in VO2 thin films on rutile TiO2 (001) substrates and identified formation mechanism of the microscaled domain. It was found that domain size decreased with increasing film thickness and the domain boundary consisted of cracks and dislocations, clarified by high-resolution transmission electron microscopy. The detailed images showed, the tensile-strained VO2 lattices received by TiO2 (001) were partially relaxed around the cracks and dislocations. The relaxed lattice is likely to return the original metal-insulator transition temperature of 340 K, whereas the tensile-strained lattice has the transition at 300 K in a VO2/TiO2 (001) system. Thus, the mixed states of strained and relaxed crystal lattice and the increase in dislocation density in thicker films cause the overly broad resistance behavior against temperature. Furthermore, the origin of the dislocations and the thickness dependence of the domain size could be explained by the energy release of shear stress generated by competition between the pinning layers at near-interface VO2 layers holding the tetragonal structure and the near-surface layers separated from the substrate attempting the lattice transformation to a monoclinic structure. This understanding enables us to more precisely design the size and configuration of these domains and their transport properties.