Slot antenna 2.45 GHz microwave plasma source
Slot antenna 2.45 GHz microwave plasma source
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DOI：
10.1088/0963-0252/3/4/004
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发表时间：
1994-11
影响因子：
3.8
通讯作者：
F. Werner;D. Korzec;J. Engemann
中科院分区：
文献类型：
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作者：
F. Werner;D. Korzec;J. Engemann
一种新的大体积微波等离子体源的技术应用的兴趣已经开发出来。一个环形波导谐振器与轴向槽在其内侧作为一个场施加器，以维持等离子体在2.45 GHz的熔融石英圆柱体的直径为16厘米，长度为49厘米。槽之间的距离等于波导波长。缝隙天线（SLAN）轴向延伸约9 cm。由于等离子体-熔融二氧化硅界面处的表面波传播，等离子体轴向填充管。的源的几何特性进行了优化，通过使用的数值代码，允许计算的电场和磁场内的缝隙天线。计算出的场型完全符合通过使用一个小的环形天线内的SLAN没有等离子体收集。等离子体源的压力范围从0.01到1毫巴和功率范围从50到1200 W的长时间稳定运行。氩等离子体的特征在于使用双朗缪尔探针。典型的结果是，对于1.2 kW的微波功率和1 mbar的气压，离子密度为1.2*1012 cm-3，电子温度为1.2 eV*11604 K eV-1。高压（1 mbar）下离子密度的最差情况方位角变化不超过25%。对于低压（0.01 mbar），方位角均匀性优于5%。
A new large-volume microwave plasma source of interest for technological applications has been developed. An annular waveguide resonator with axial slots on its inner side acts as a field applicator to sustain a plasma at 2.45 GHz in a fused silica cylinder of 16 cm in diameter and 49 cm in length. The distance between slots is equal to a waveguide wave length. The slot antenna (SLAN) extends axially for about 9 cm. The plasma fills the tube axially as a result of surface wave propagation at the plasma-fused silica interface. The geometrical properties of the source were optimized by use of a numerical code allowing calculation of electric and magnetic fields inside the slot antenna. The calculated field patterns fit perfectly to those collected by use of a small loop antenna inside the SLAN without a plasma. A long time stable operation of the plasma source for pressure range from 0.01 to 1 mbar and power range from 50 to 1200 W was achieved. Argon plasma was characterized by use of a double Langmuir probe. Typical results are an ion density of 1.2*1012 cm-3 and an electron temperature of 1.2 eV*11604 K eV-1 for a microwave power of 1.2 kW and a gas pressure of 1 mbar. The worst case azimuthal variation of the ion density for high pressure (1 mbar) does not exceed 25%. For low pressure (0.01 mbar) the azimuthal homogeneity is better than 5%.