Interface sharpening in CoFeB magnetic tunnel junctions
Interface sharpening in CoFeB magnetic tunnel junctions
复制标题
CoFeB 磁性隧道结中的界面锐化
DOI：
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发表时间：
2006
期刊：
影响因子：
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通讯作者：
J. Wecker
中科院分区：
文献类型：
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作者：
A. Pym;A. Lamperti;B. Tanner;T. Dimopoulos;M. Rührig;J. Wecker
本文报道了在低于Co60Fe20B20结晶温度的原位退火过程中，无定形Co60Fe20B20和AlOx之间界面锐化的掠入射x射线散射证据。镜面散射中干涉条纹振幅的增强和漫射散射变化的消失表明锐化不是拓扑粗糙度的降低，而是界面上化学成分剖面宽度的减小。锐化发生的温度对应于磁性隧道结隧穿磁阻最大值的温度。
We report grazing incidence x-ray scattering evidence for sharpening of the interface between amorphous Co60Fe20B20 and AlOx during in situ annealing below the Co60Fe20B20 crystallization temperature. Enhancement of the interference fringe amplitude in the specular scatter and the absence of changes in the diffuse scatter indicate that the sharpening is not a reduction in topological roughness but a reduction in the width of the chemical composition profile across the interface. The temperature at which the sharpening occurs corresponds to that at which a maximum is found in the tunneling magnetoresistance of magnetic tunnel junctions.