Interface-mediated noble metal deposition on transition metal dichalcogenide nanostructures
Interface-mediated noble metal deposition on transition metal dichalcogenide nanostructures
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DOI:
10.1038/s41557-020-0418-3
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发表时间:
2020-02
期刊:
影响因子:
21.8
通讯作者:
Yifan Sun;Yuanxi Wang;Jamie Y. C. Chen;K. Fujisawa;Cameron F. Holder;Jeffery T. Miller;V. Crespi
中科院分区:
文献类型:
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作者:
Yifan Sun;Yuanxi Wang;Jamie Y. C. Chen;K. Fujisawa;Cameron F. Holder;Jeffery T. Miller;V. Crespi
Functionalizing the surfaces of transition metal dichalcogenide (TMD) nanosheets with noble metals is important for electrically contacting them to devices, as well as improving their catalytic and sensing capabilities. Solution-phase deposition provides a scalable approach to the creation of metal–TMD hybrid systems, but controlling such processes remains challenging. Here we elucidate the different pathways by which gold and silver deposit at room temperature onto colloidal 1T-WS2, 2H-WS2, 2H-MoSe2, 2H-WSe2, 1T′-MoTe2and Td-WTe2few-layer nanostructures to produce several distinct classes of 0D–2D and 2D–2D metal–TMD hybrids. Uniform gold nanoparticles form on all of the TMDs. By contrast, silver deposits as nanoparticles with a bimodal size distribution on the disulfides and diselenides, and as atomically thin layers on the ditellurides. The various sizes and morphologies of these surface-bound metal species arise from the relative strengths of the interfacial metal–chalcogen bonds during the reduction of Au3+or Ag+by the TMDs.