Nanostructure characterization of tungsten-containing nanorods deposited by electron-beam-induced chemical vapour decomposition

Nanostructure characterization of tungsten-containing nanorods deposited by electron-beam-induced chemical vapour decomposition
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DOI:
10.1080/14786430310001646772
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发表时间:
2004-04-21
影响因子:
1.6
通讯作者:
Furuya, K
Furuya, K
中科院分区:
材料科学3区
文献类型:
--
作者:
Han, M;Mitsuishi, K;Furuya, K

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在扫描透射电子显微镜中使用羰基钨(W(CO)(6))的前体进行电子束诱导的化学气相分解。自支撑纳米棒从C膜的边缘生长,其宽度取决于制造过程中使用的电子束扫描速度。沉积的纳米棒的纳米结构的特征在于使用能量色散X射线光谱,选区电子衍射,微衍射和高分辨率透射电子显微镜详细。对于用于沉积的所有束扫描速度,观察到纳米晶和非晶相的混合物。高分辨率透射电子显微镜表明,在沉积的纳米棒中的纳米晶体的尺寸范围在1.5和2.0 nm之间。在沉积的纳米棒中存在纯W纳米晶的直接证据通过显微衍射揭示。
Electron-beam-induced chemical vapour decomposition was performed in a scanning transmission electron microscope using a precursor of tungsten carbonyl (W(CO) (6)). The self-supporting nanorods were grown from the edges of a C film with widths that depend on the electron-beam scanning speed used in the fabrication process. The nanostructure of as-deposited nanorods has been characterized in detail using energy-dispersive X-ray spectroscopy, selected-area electron diffraction, microdiffraction and high-resolution transmission electron microscopy. A mixture of nanocrystallites and amorphous phases was observed for all beam scanning speeds used for deposition. High-resolution transmission electron microscopy demonstrated that the size of nanocrystallites in as-deposited nanorods ranges between 1.5 and 2.0 nm. The direct evidence of the presence of pure W nanocrystallites in as-deposited nanorods was revealed by microdiffraction.