Polishing of Ultra Smooth Surface with Nanoparticle Colloid Jet
Polishing of Ultra Smooth Surface with Nanoparticle Colloid Jet
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DOI：
10.4028/www.scientific.net/kem.404.143
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发表时间：
2009-01
期刊：
影响因子：
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通讯作者：
Fei-hu Zhang;X. Song;Y. Zhang;D. Luan
中科院分区：
文献类型：
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作者：
Fei-hu Zhang;X. Song;Y. Zhang;D. Luan
研制了一种用于脆性材料超光滑表面抛光的纳米粒子胶体射流加工系统。给出了纳米颗粒胶体射流加工中纳米颗粒与工作面的相互作用，并通过材料去除实验研究了纳米颗粒胶体射流加工中各种重要工艺参数对材料去除效率的理论依赖关系。纳米粒子胶体射流加工的材料去除结果表明，在适当的加工工艺参数下，玻璃表面的去除速度可以达到每分钟1纳米级。为了获得超光滑的表面，对K9玻璃表面进行了抛光。原子力显微镜(AFM)观测的表面粗糙度在1 nm RMS以下。
A nanoparticle colloid jet machining system has been developed for polishing ultra smooth surface of brittle materials. Interaction between nanoparticles and work surface in nanoparticle colloid jet machining has been given, and the theoretical dependence of the material removal rate with various important process parameters of the nanoparticle colloid jet machining have been investigated through material removal experiments. Some material removal results of nanoparticle colloid jet machining show that it is possible to obtain removal rates of one nanometer level per minute for glass surfaces with appropriate machining process parameters. A K9 glass surface was polished for obtaining ultra smooth surface. The surface roughness value of atomic force microscopy (AFM) observations is under 1nm Rms.