Surface nitridation of titanium metal by means of a gas tunnel type plasma jet
Surface nitridation of titanium metal by means of a gas tunnel type plasma jet
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利用气体隧道式等离子射流对钛金属进行表面氮化
DOI：
10.1007/bf02649339
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发表时间：
1996
影响因子：
2.3
通讯作者：
A. Kobayashi
中科院分区：
文献类型：
--
作者：
A. Kobayashi
采用气体隧道式等离子体射流，在氮气气氛中，在低压下对钛进行了表面氮化。氮化钛（TiN）膜，10微米厚和2000 HV，可以在10秒内形成。用XRD研究了TiN薄膜的结构。测量了薄膜表面的维氏硬度。研究了沉积条件对TiN薄膜性能（TiN厚度、维氏硬度等）的影响。研究了这种沉积方法的优点。
The surface nitridation of titanium was carried out at a low pressure in nitrogen atmosphere using a gas tunnel type plasma jet. The titanium nitride (TiN) film, 10 µm thick and 2000 HV, could be formed in 10 s. The structure of the TiN film was investigated by XRD. The Vickers hardness on the surface of the film was measured. The effects of deposition conditions on the properties of TiN films (TiN thickness,Vickers hardness, etc.) were investigated, and the advantage of this deposition method was identified from those results.