DNA damage by soft X-ray exposure at oxygen K-edge
DNA damage by soft X-ray exposure at oxygen K-edge
复制标题
氧 K 边缘软 X 射线照射造成 DNA 损伤
DOI：
10.1088/1742-6596/502/1/012040
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发表时间：
2013
期刊：
影响因子：
--
通讯作者：
and A. Yokoya
中科院分区：
文献类型：
--
作者：
Y. Sugaya;A. Narita;K. Fujii;and A. Yokoya
为了获得详细的见解的物理化学机制的DNA损伤诱导的光吸收模式，我们已经制备了薄的DNA膜的闭环质粒（PUC18）的盖玻片上没有任何添加剂。利用这种薄膜，我们进行了初步的实验，暴露于软X射线与周围的氧K壳层电离阈值的能量。通过生化处理来量化链断裂和碱基损伤或AP位点的DNA损伤量。证实了DNA薄膜可以作为标本辐照。DNA中氧原子的K壳层电子的π* 激发引起的DNA损伤产额明显大于氧K电离。
In order to obtain detailed insights into the physicochemical mechanism of DNA damage induction in terms of photoabsorption modes, we have prepared thin DNA films of closed circular plasmid (pUC18) on a cover slip without any additives. Using this film, we have performed preliminary experiments by exposing to soft X-rays with energies around oxygen K-shell ionization threshold. The DNA damage yields of strand breaks and base lesions or AP sites were quantified by biochemical treatments. We confirmed that the DNA film can work as a specimen irradiation. The DNA damage yields induced by π* excitation of a K-shell electron of oxygen atoms in DNA were significantly larger those for oxygen K-ionization.