Submicron patterning of thin cobalt films for magnetic storage
Submicron patterning of thin cobalt films for magnetic storage
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DOI：
10.1116/1.587499
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发表时间：
1994-11
影响因子：
1.4
通讯作者：
R. New;R. Pease;R. White
中科院分区：
文献类型：
--
作者：
R. New;R. Pease;R. White
我们正在研究一种记录介质的可行性，在这种记录介质中，每一位信息都存储在一个单畴磁粒子中。为此，我们开发了一种使用直接写入电子束光刻和多步溅射蚀刻工艺对磁记录薄膜进行高分辨率图像化的程序。我们已经使用该方法定义了特征尺寸小至0.1 μm的多晶磁性薄膜的小岛屿。图像化工艺适用于许多不同类型的磁性薄膜，包括单晶外延生长薄膜，并且设计用于最小化对被图像化磁性材料的物理和化学损伤。原子力显微镜和x射线光谱学都证实了用这种方法形成的磁岛在物理上是相互隔离的。
We are investigating the feasibility of a recording medium in which each bit of information is stored in a single‐domain magnetic particle. To this end we have developed a procedure for high‐resolution patterning of magnetic recording films using direct write electron‐beam lithography and a multistep sputter etching process. We have used this procedure to define small islands of polycrystalline magnetic thin film with feature sizes down to 0.1 μm. The patterning process is suitable for many different kinds of magnetic films, including single‐crystal epitaxially grown films, and is designed to minimize physical and chemical damage to the magnetic material being patterned. Both atomic force microscopy and x‐ray photoemission spectroscopy have been used to establish that the magnetic islands patterned using this process are physically isolated from each other.