Ultraprecision grinding of chemical vapor deposited silicon carbide mirrors for synchrotron radiation
Ultraprecision grinding of chemical vapor deposited silicon carbide mirrors for synchrotron radiation
复制标题
同步辐射用化学气相沉积碳化硅反射镜的超精密磨削
DOI：
10.1117/12.259864
复制
发表时间：
1996
期刊：
影响因子：
--
通讯作者：
Y. Namba
中科院分区：
文献类型：
--
作者：
Y. Namba
化学气相沉积碳化硅（CVD-SiC）是高亮度同步辐射光束线反射镜最重要的材料，但该材料很难加工。抛光SiC衬底以制造镜子需要相当长的时间。本文旨在通过采用超精密磨削技术来减少制造CVD-SiC反射镜的加工时间。 CVD-SiC 样品已通过树脂结合剂金刚石砂轮和具有极低热膨胀玻璃陶瓷主轴的超精密平面磨床研磨至表面粗糙度为 0.4 nm rms。使用 TOPO-3D 和 AFM 测量磨削样品的表面粗糙度。使用波长0.834 nm的X射线、掠入射角0.7-0.95度测量，在磨削的CVD-SiC平坦表面上获得了88.7%的反射率。反射率取决于入射光束方向与样品上的研磨痕迹之间的角度。还讨论了表面粗糙度与磨削条件之间的关系。
Chemically vapor deposited silicon carbide (CVD-SiC) is the most important material of mirrors for high-brightness synchrotron radiation beamlines, though the material is too difficult to be machined. It takes quite a long time to polish SiC substrate to make mirrors. This paper intends to reduce the machining time to make CVD-SiC mirrors by using ultra-precision grinding technology. The CVD-SiC sample has been ground into 0.4 nm rms in surface roughness by a resinoid-bonded diamond wheel and an ultra-precision surface grinder having a glass-ceramic spindle of extremely-low thermal expansion. The surface roughness of ground samples were measured with TOPO-3D and AFM. 88.7% reflectivity has been obtained on the ground CVD-SiC flat surface, measured with X-ray of 0.834 nm in wavelength at the grazing incidence angle of 0.7 - 0.95 degree. The reflectivity depends upon the angle between the direction of incident beam and grinding marks on the sample. The relationship between the surface roughness and grinding conditions was also discussed.