Nanoscale Trapping of Interlayer Excitons in a 2D Semiconductor Heterostructure
Nanoscale Trapping of Interlayer Excitons in a 2D Semiconductor Heterostructure
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DOI:
10.1021/acs.nanolett.1c01215
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发表时间:
2021-06-24
期刊:
影响因子:
10.8
通讯作者:
Schaibley, John R.
中科院分区:
文献类型:
--
作者:
Shanks, Daniel N.;Mahdikhanysarvejahany, Fateme;Schaibley, John R.
For quantum technologies based on single excitons and spins, the deterministic placement and control of a single exciton is a longstanding goal. MoSe2-WSe2 heterostructures host spatially indirect interlayer excitons (IXs) that exhibit highly tunable energies and unique spin-valley physics, making them promising candidates for quantum information processing. Previous IX trapping approaches involving moire ' superlattices and nanopillars do not meet the quantum technology requirements of deterministic placement and energy tunability. Here, we use a nanopatterned graphene gate to create a sharply varying electric field in close proximity to a MoSe2-WSe2 heterostructure. The dipole interaction between the IX and the electric field creates an similar to 20 nm trap. The trapped IXs show the predicted electric-field-dependent energy, saturation at low excitation power, and increased lifetime, all signatures of strong spatial confinement. The demonstrated architecture is a crucial step toward the deterministic trapping of single IXs, which has broad applications to scalable quantum technologies.