Direct Introduction of a Dimesitylboryl Group Using Base-Mediated Substitution of Aryl Halides with Silyldimesitylborane
Direct Introduction of a Dimesitylboryl Group Using Base-Mediated Substitution of Aryl Halides with Silyldimesitylborane
复制标题
使用甲硅烷基二甲硼烷取代芳基卤化物直接引入二甲硼基
DOI：
10.1002/chem.201604021
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发表时间：
2016
期刊：
影响因子：
--
通讯作者：
H.
中科院分区：
文献类型：
--
作者：
Yamamoto;E; Izumi;K.; Shishido;R.; Seki;T.; Tokodai;N.; Ito;H.
描述了在碱金属醇盐存在下，芳基卤化物与带有二均三甲苯硼基的甲硅烷基硼烷的第一次二均三甲苯硼基取代。芳基溴化物或碘化物与Ph 2 MeSi-BMes 2和Na（OtBu）的反应以良好至高的产率和高的硼基化/甲硅烷基化比率提供了所需的芳基二均三甲苯基硼烷。二溴芳烃的空间位阻较小的C-Br键的选择性反应提供了单硼化产物。该反应用于快速构建具有非对称联苯间隔基的D-π-A芳基二均三甲苯基硼烷。
The first dimesitylboryl substitution of aryl halides with a silylborane bearing a dimesitylboryl group in the presence of alkali‐metal alkoxides is described. The reactions of aryl bromides or iodides with Ph2MeSi−BMes2and Na(OtBu) afforded the desired aryl dimesitylboranes in good to high yields and with high borylation/silylation ratios. Selective reaction of the sterically less‐hindered C−Br bond of dibromoarenes provided monoborylated products. This reaction was used to rapidly construct a D‐π‐A aryl dimesityl borane with a non‐symmetrical biphenyl spacer.