An experimental assessment of proposed universal yield curves for secondary electron emission
An experimental assessment of proposed universal yield curves for secondary electron emission
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对二次电子发射通用产率曲线的实验评估
DOI：
10.1088/0022-3727/13/2/025
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发表时间：
1980
期刊：
影响因子：
--
通讯作者：
E. A. Flinn
中科院分区：
文献类型：
--
作者：
M. Salehi;E. A. Flinn
已经提出了多种用于二次发射过程的“通用屈服曲线”。一系列精确测量的二次发射特性的范围内的相关的非晶半导体材料，在超高真空下新鲜的真空劈裂的表面，并涵盖了广泛的初级能量，最近有可能准确评估的有效性的各种UYC建议。结果发现，没有真正的通用曲线存在的靶材料的原子序数起着重要的作用，在确定的二次发射性能。Agarwal的半经验表达式，其中考虑到原子序数和重量，被发现给所有的材料研究良好的协议。需要进一步的理论研究。
A variety of 'Universal Yield Curves' for the secondary emission process have been proposed. A series of precise measurements of the secondary emission properties of a range of related amorphous semiconducting materials, made under UHV on freshly vacuum-cleaved surfaces, and covering a wide range of primary energies, have recently made possible an accurate assessment of the validity of the various UYCs suggested. It is found that no truly universal curve exists; the atomic number of the target materials plays an important part in determining the secondary emission properties. Agarwal's semi-empirical expression, which takes account of the atomic number and weight, is found to give good agreement for all the materials studied. Further theoretical investigation is required.