Correlation between etch pits formed by molten KOH+Na2O2 etching and dislocation types in heavily doped n+-4H–SiC studied by X-ray topography
Correlation between etch pits formed by molten KOH+Na2O2 etching and dislocation types in heavily doped n+-4H–SiC studied by X-ray topography
复制标题
X射线形貌研究重掺杂n+-4H-SiC熔融KOH+Na2O2刻蚀形成的刻蚀坑与位错类型的相关性
DOI：
10.1016/j.jcrysgro.2012.12.011
复制
发表时间：
2013
影响因子：
1.8
通讯作者：
K. Nishikawa
中科院分区：
文献类型：
--
作者：
Yongzhao Yao;Y. Ishikawa;Y. Sugawara;Kōji Sato;K. Danno;H. Suzuki;T. Bessho;S. Yamaguchi;K. Nishikawa
