Semipolar InGaN/GaN nanostructure light-emitting diodes on c-plane sapphire
Semipolar InGaN/GaN nanostructure light-emitting diodes on c-plane sapphire
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DOI:
10.7567/apex.9.032101
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发表时间:
2016-02
影响因子:
2.3
通讯作者:
A. Rishinaramangalam;M. Nami;Michael N. Fairchild;D. Shima;G. Balakrishnan;S. Brueck;D. Feezell
中科院分区:
文献类型:
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作者:
A. Rishinaramangalam;M. Nami;Michael N. Fairchild;D. Shima;G. Balakrishnan;S. Brueck;D. Feezell
The fabrication of electrically injected triangular-nanostripe core–shell semipolar III–nitride LEDs (TLEDs) is demonstrated using interferometric lithography and catalyst-free bottom-up selective-area metal–organic chemical vapor deposition (MOCVD). This alternative approach enables semipolar orientations on inexpensive, c-plane sapphire substrates, in comparison with planar growth on free-standing GaN substrates. Transmission electron microscopy and energy dispersive X-ray spectroscopy reveal nonuniform quantum well thickness and composition, respectively, as a function of location on the triangular stripes. The broad electroluminescence spectra, wavelength shift with increasing current density, and nonlinear light vs current characteristics are well correlated with the observed quantum-well nonuniformities.