Fabrication of sol-gel derived ferroelectric Pb0.865La0.09Zr0.65Ti0.35O3 optical waveguides
Fabrication of sol-gel derived ferroelectric Pb0.865La0.09Zr0.65Ti0.35O3 optical waveguides
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溶胶凝胶衍生铁电 Pb0.865La0.09Zr0.65Ti0.35O3 光波导的制造
DOI：
10.1063/1.353928
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发表时间：
1993
影响因子：
3.2
通讯作者：
D. Polla
中科院分区：
文献类型：
--
作者：
P. Baude;C. Ye;T. Tamagawa;D. Polla
使用溶胶凝胶沉积技术在硅基板上沉积了无裂纹透明铁电 Pb0.865La0.09Zr0.65Ti0.35O3 [PLZT (9/65/35)] 薄膜。使用 Pb0.90La0.10Ti0.975O3 (PLT) 中间层来提高 PLZT 的光学质量并减少薄膜破裂量。研究了湿法化学蚀刻、等离子体蚀刻和反应离子蚀刻作为实现必要的波导结构的方法。在通过反应离子束蚀刻制造的 2-4 mm 长、20 μm 宽的 PLZT (9/65/35) 脊形波导中观察到波导。
Crack‐free transparent ferroelectric Pb0.865La0.09Zr0.65Ti0.35O3 [PLZT (9/65/35)] thin films have been deposited on silicon substrates using the sol‐gel deposition technique. An intermediate layer of Pb0.90La0.10Ti0.975O3 (PLT) was used to improve the PLZT’s optical quality and to reduce the amount of film cracking. Wet chemical etching, plasma etching, and reactive ion etching were investigated as means of realizing the necessary waveguide structures. Waveguiding was observed in 2–4 mm long by 20 μm wide PLZT (9/65/35) ridge waveguides fabricated by reactive ion beam etching.