Transparent conductive and near-infrared reflective Cu-based Al-doped ZnO multilayer films grown by magnetron sputtering at room temperature
Transparent conductive and near-infrared reflective Cu-based Al-doped ZnO multilayer films grown by magnetron sputtering at room temperature
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DOI：
10.1016/j.apsusc.2011.01.068
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发表时间：
2011-05
影响因子：
6.7
通讯作者：
Wang Yunli;Jianguo Lu;Xun Bie;Z. Ye;Xuewen Li;D. Song;Xiong Zhao;W. Ye
中科院分区：
文献类型：
--
作者：
Wang Yunli;Jianguo Lu;Xun Bie;Z. Ye;Xuewen Li;D. Song;Xiong Zhao;W. Ye
采用直流磁控溅射法在玻璃衬底上制备了Cu基Al掺杂ZnO多层膜。设计了AZO/Cu、AZO/Cu/AZO和Cu/AZO三种多层膜结构作为对比，研究了Cu层厚度对多层膜光电性能的影响。结果表明，薄膜的光电性能和近红外反射率与Cu层厚度密切相关，其中AZO/Cu双层薄膜具有较好的光电性能。Cu层厚度为7 nm的AZO/Cu双层膜显示出最高的品质因数为4.82×10−3Ω−1，方块电阻为21.7Ω/sq，可见光透过率为80%。可同时获得50%以上的近红外反射率。该涂层具有良好的性能，在镀膜玻璃、薄膜太阳能电池和热反射器等方面具有良好的应用前景。
Cu-based Al-doped ZnO multilayer films were deposited on glass substrates by DC magnetron sputtering at room temperature. Three kinds of multilayer structures (AZO/Cu, AZO/Cu/AZO, and Cu/AZO) were designed for comparison, and the effects of the Cu layer thickness on photoelectrical properties of the multilayer films were investigated. The results revealed that the transparent-conductive property and near-infrared reflectance of the films are closely correlated with the Cu layer thickness, and among the three structures, AZO/Cu bi-layer films exhibited preferable photoelectrical properties. The AZO/Cu bi-layer film with a Cu layer thickness of 7nm displayed the highest figure of merit of 4.82×10−3Ω−1, with a low sheet resistance of 21.7Ω/sq and an acceptable visible transmittance of 80%. The near infrared reflectance above 50% can be simultaneously obtained. The good performance of the coatings indicates that they are promising for coated glasses, thin film solar cells and heat-reflectors.