Measurement and control of absolute nitrogen atom density in an electron-beam-excited plasma using vacuum ultraviolet absorption spectroscopy
Measurement and control of absolute nitrogen atom density in an electron-beam-excited plasma using vacuum ultraviolet absorption spectroscopy
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DOI：
10.1063/1.1305559
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发表时间：
2000-08-15
影响因子：
3.2
通讯作者：
Sakamoto, Y
中科院分区：
文献类型：
--
作者：
Tada, S;Takashima, S;Sakamoto, Y
利用真空紫外吸收光谱技术，在微放电空心阴极灯上研究了超低压电子束激发等离子体（EBEP）中氮原子的绝对密度。测量的N原子密度估计为约6 × 10（11）cm（-3），在N-2压力为0.05 Pa，电子束电流为10 A，电子束加速电压为120 V。EBEP潜在地使我们能够独立地控制电子密度和电子能量与电子束电流和电子-电子束加速电压。结果表明，在低压条件下，N原子密度随电子束流和电子加速电压的增加而增加。EBEP作为一种在超低压下工作的N原子源显示出很大的前景。(C)2000年美国物理学会。[S0021-8979（00）01616-9]。
The absolute nitrogen (N) atom density in an electron-beam-excited plasma (EBEP) operating at an ultralow pressure has been investigated by vacuum ultraviolet absorption spectroscopy, employing a microdischarge hollow-cathode lamp. The measured N atom density was estimated to be around 6x10(11) cm(-3), and the dissociation fraction was 4.9% at a N-2 pressure of 0.05 Pa, an electron-beam current of 10 A, and an electron-beam acceleration voltage of 120 V. The EBEP potentially enables us to control the electron density and electron energy independently with the electron-beam current and electron-beam acceleration voltages, respectively. It was found that N atom densities increased with increasing electron-beam current and electron acceleration voltage under low-pressure conditions. The EBEP shows great promise as a N atom source operating at an ultralow pressure. (C) 2000 American Institute of Physics. [S0021-8979(00)01616-9].