Efficient synthesis of graphene oxide and the mechanisms of oxidation and exfoliation
Efficient synthesis of graphene oxide and the mechanisms of oxidation and exfoliation
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氧化石墨烯的高效合成及其氧化和剥离机制
DOI：
10.1016/j.apsusc.2017.04.181
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发表时间：
2017-09
影响因子：
6.7
通讯作者：
Jianmin Chen
中科院分区：
文献类型：
--
作者：
Rui Yuan;Jing Yuan;Yanping Wu;Lei Chen;Huidi Zhou;Jianmin Chen
An efficient method for the preparation of graphene oxide (GO) was descried through inducing the ultrasonic in the rate-determining step of oxidation processes. Both the transformation procedures and the detailed molecular behavior of parent graphene (PG), partially oxidized graphene (PGO) and GO in H2SO4and aqueous solution were investigated by molecular dynamic simulation (MD) combining with experiments. The results obtained from MD simulation show that the addition of KMnO4truly marked the beginning of the reaction which carried out from the border of PG flakes to the centre. This oxidation procedure was the rate-determining step and mainly contained three steps: the boundary carbon atoms oxidized, the distance of the corresponding interlayer enlarged and the oxidizing agent diffused into the unoxidized region, the processes was repeated until oxidized completely. So, the introducing ultrasonic in this section can accelerate not only the exfoliation of layers but also the diffusion of oxidizer and finally raises the oxidation efficiency dramatically. To further clarify these simulation results, the GO was prepared by the method mentioned above. The analyses results for the X-ray diffraction (XRD), Raman spectra and X-ray photoelectron spectroscopy (XPS) of the resulting GO show that the ultrasonic method could perfectly shortens the oxidation time from 12 h to 3 h and forms the higher degree of oxidation products with more carboxylic acid groups on its edges. Thus, this study provides a better understanding of the transformation procedures of graphite and proposes an efficient way to produce GOs suitable for various chemical modifications.
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影响因子：
6.7
作者：
N. Todorova;T. Giannakopoulou;N. Boukos;E. Vermisoglou;C. Lekakou;C. Trapalis
通讯作者：
N. Todorova;T. Giannakopoulou;N. Boukos;E. Vermisoglou;C. Lekakou;C. Trapalis
FeCl3 插层少层石墨片：费米能级的拉曼测定、逐层解耦和稳定性
影响因子：
15
作者：
Zhao, Weijie;Tan, Ping Heng;Ferrari, Andrea C.
通讯作者：
Ferrari, Andrea C.
影响因子：
11.9
作者：
Eigler, Siegfried;Grimm, Stefan;Hirsch, Andreas
通讯作者：
Hirsch, Andreas
DOI：
10.1021/acs.langmuir.5b04161
发表时间：
2016-01
期刊：
Langmuir : the ACS journal of surfaces and colloids
影响因子：
--
作者：
Fereshte Taherian;F. Leroy;L. Heim;E. Bonaccurso;N. V. D. van der Vegt
通讯作者：
Fereshte Taherian;F. Leroy;L. Heim;E. Bonaccurso;N. V. D. van der Vegt
影响因子：
4
作者：
Cançado, LG;Takai, K;Pimenta, MA
通讯作者：
Pimenta, MA