An Ultra-steep Slope Two-dimensional Strain Effect Transistor
An Ultra-steep Slope Two-dimensional Strain Effect Transistor
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DOI:
10.1021/acs.nanolett.2c02194
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发表时间:
2022-11-23
期刊:
影响因子:
10.8
通讯作者:
Das, Saptarshi
中科院分区:
文献类型:
--
作者:
Das, Sarbashis;Das, Saptarshi
We introduce a high-performance and ultra-steep slope switch, referred to as strain effect transistor (SET), with a subthreshold swing < 0.68 mV/decade at room temperature for 7 orders of magnitude change in the source-to-drain current based on atomically thin 1T '-MoTe2 as the channel material, piezoelectric lead zirconate titanate (PZT) as the gate dielectric, and nickel (Ni) as the source/drain contact metal. We exploit gate voltage induced strain transduction in PZT leading to abrupt and reversible cracking of the metal contacts to achieve the abrupt switching. The SET also exhibits a low OFF-state current < 1 pA/ mu m, a high ON-state current > 1.8 mA/mu m at a supply voltage of 1 V, a large current ON/OFF ratio > 1 x 109, and a high transconductance of > 100 mu S/mu m. The switching delay for the SET was found to be < 5 mu s, and no device failure was observed even after 1 million (1 x 106) switching cycles.