Tailoring the surface morphology of carbon nanotube forests by plasma etching: A parametric study-猫眼课题宝

DOI：

10.1016/j.carbon.2021.04.066

发表时间：

2021-05

期刊：

Carbon

影响因子：

10.9

通讯作者：

中科院分区：

材料科学2区

文献类型：

作者：

Seungju Seo;Sanha Kim;S. Yamamoto;Kehang Cui;T. Kodama;J. Shiomi;Taiki Inoue;S. Chiashi;S. Maruyama;A. Hart

在热化学气相沉积(CVD)过程中，由于碳纳米管(CNT)的自组织，在CVD过程的初始阶段，碳纳米管(CNT)的“森林”表面通常具有缠绕的表面。在不破坏碳纳米管森林的固有微结构的情况下，去除这一表层的“结皮”层往往是进一步应用的关键一步。本文研究了利用Ar/O2等离子体刻蚀来修饰多壁碳纳米管森林的表面形貌。首先，我们研究了包括等离子体功率、流量和气体组成在内的工艺参数对碳纳米管森林刻蚀的影响。因此，我们确定了成功去除顶层地壳而又保持碳纳米管森林结构形状的等离子体条件。其次，我们制备了不同堆积密度和高度的碳纳米管森林，研究初始特性对刻蚀结果的影响。我们从实验上证实，刻蚀速率强烈依赖于结壳层的密度和形貌。我们还比较了垂直方向和横向的材料去除率。最后，我们探索了用Ar/O2等离子体增强碳纳米管森林顶面的排列和化学均匀度

The top surface of carbon nanotube (CNT) “forests” produced by thermal chemical vapor deposition (CVD) often has a tangled morphology, owing to the self-organization of the CNTs at the initial stage of the CVD process. Removal of this top “crust” layer, without damaging the intrinsic microstructure of the CNT forest is often a key step for further applications. This paper studies the tailored use of Ar/O2plasma etching to modify the surface morphology of multi-walled CNT forests. First, we investigate the effects of process parameters including plasma power, flow rate, and gas composition on the etching of CNT forests. As a result, we identify the plasma conditions that successfully remove the top crust yet maintain the structural shape of a CNT forest. Second, we prepare CNT forests having different packing densities and heights to study the influence of the initial characteristics on the etching result. We experimentally confirm that the etching rate depends strongly on the density and morphology of the crust layer. We also compare the material removal rate in vertical and lateral directions. Finally, we explore the enhancement of alignment and chemical uniformity of the top surface of CNT forests by the Ar/O2plasma

Tailoring the surface morphology of carbon nanotube forests by plasma etching: A parametric study

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