Heterojunction Diodes Comprising p-Type Ultrananocrystalline Diamond Films Prepared by Coaxial Arc Plasma Deposition and n-Type Silicon Substrates
Heterojunction Diodes Comprising p-Type Ultrananocrystalline Diamond Films Prepared by Coaxial Arc Plasma Deposition and n-Type Silicon Substrates
复制标题
同轴电弧等离子体沉积p型超纳米晶金刚石薄膜和n型硅衬底的异质结二极管
DOI：
10.7567/jjap.52.065801
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发表时间：
2013
影响因子：
1.5
通讯作者：
and Tsuyoshi Yoshitake
中科院分区：
文献类型：
--
作者：
Yūki Katamune;Shinya Ohmagari;Sausan Al-Riyami;Seishi Takagi;Mahmoud Shahan;and Tsuyoshi Yoshitake
