2D-Confined Nanochannels Fabricated by Conventional Micromachining
2D-Confined Nanochannels Fabricated by Conventional Micromachining
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DOI：
10.1021/nl025693r
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发表时间：
2002-08
期刊：
影响因子：
10.8
通讯作者：
N. Tas;T. Lammerink;P. Mela;H. Jansen;M. Elwenspoek;A. Berg
中科院分区：
文献类型：
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作者：
N. Tas;T. Lammerink;P. Mela;H. Jansen;M. Elwenspoek;A. Berg
两种新的方法已经发展到制造纳米通道的常规微机械加工。我们成功地将通道的宽度限制在亚微米级，同时使用分辨率为1 m的标准光刻法。第一种方法是基于牺牲蚀刻的纳米线，这是形成在侧壁上的步骤。第二种方法是基于在去除将两者分开的牺牲带之后将覆盖层粘附到衬底。制造的纳米通道是局部的，可以连接到微通道和水库。
Two new methods have been developed to fabricate nanochannels by conventional micromachining. We succeeded in restricting the width of the channels to the submicrometer scale, while using standard photolithography with a resolution in the order of 1 m. The first method is based on the sacrificial etching of a nanowire, which was formed on the side wall of a step. The second method is based on the adhesion of the capping layer to the substrate after removal of a sacrificial strip separating the two. The fabricated nanochannels are localized and can be connected to microchannels and reservoirs.