Photo-switching Behavior of Microphase Separated Structure in Liquid Crystalline Azobenzene Block Copolymers Possessing Different Poly(alkyl methacrylate) Blocks
Photo-switching Behavior of Microphase Separated Structure in Liquid Crystalline Azobenzene Block Copolymers Possessing Different Poly(alkyl methacrylate) Blocks
复制标题
具有不同聚甲基丙烯酸烷基酯嵌段的液晶偶氮苯嵌段共聚物中微相分离结构的光开关行为
DOI:
10.1080/15421406.2015.1075356
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发表时间:
2015
期刊:
影响因子:
--
通讯作者:
T. Seki
中科院分区:
文献类型:
--
作者:
M. Sano;T. Murase;M. Hara;S. Nagano;Y. Shinohara;Y. Amemiya;T. Seki
We have recently reported the photo-switching process of hierarchical structures of microphase separated (MPS) cylindrical structures embedded in a liquid crystalline (LC) phase in a film of a diblock copolymer composed of amorphous poly(butyl methacrylate) (PBMA) and a light responsive LC azobenzene (Az) blocks. In the present work, homologous poly(alkyl methacrylate) of poly(hexyl methacrylate) (PHMA) and poly(octadecyl methacrylate) (PODMA) are introduced as the cylinder forming polymer block. The Az mesogens and MPS cylinders in these polymers were aligned in the in-plane direction, and the alignments were photo-switched by changing LPL irradiation direction. The PODMA containing block copolymer exhibited a different reorientation behavior from PHMA or PBMA contained block copolymer. It was suggested that the viscosity or fluidity of cylindrical polymer affect the photoswitching alignment behavior.