In-Situ Observation of Crystal Alignment under a Magnetic Field Using X-ray Diffraction
In-Situ Observation of Crystal Alignment under a Magnetic Field Using X-ray Diffraction
复制标题
使用 X 射线衍射原位观察磁场下晶体排列
DOI：
10.2320/matertrans.mi200719
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发表时间：
2007
影响因子：
1.2
通讯作者：
S. Asai
中科院分区：
文献类型：
--
作者：
T. Kohama;H. Takeuchi;M. Usui;J. Akiyama;M. Sung;K. Iwai;S. Asai
通过 X 射线衍射原位检查了在施加静磁场的情况下铋颗粒的晶体排列行为。由于铋晶体的 c 面垂直于磁场方向排列，因此通过 X 射线衍射测量铋的 (110) 峰值强度的时间变化以确定晶体排列。随着磁场强度的增加，对准时间减少。这种趋势与计算弛豫时间的趋势类似。易磁轴和难磁轴之间磁化率的差异是晶体排列的驱动力，而铋颗粒的聚集降低了该驱动力。通过测量不同强度磁场下颗粒的排列时间来估计聚集的铋颗粒的磁化率的有效差异。磁化率的估计有效差异通常随着磁场强度的降低而增加。此外，在本研究中，感应电流和外加磁场之间的相互作用对晶体旋转的干扰可以忽略不计。为了降低晶体排列所需的磁场强度，应减少小颗粒的数量。 [doi:10.2320/matertrans.MI200719]
The crystal alignment behavior of bismuth particles in the presence of an imposed static magnetic field was examined in situ by X-ray diffraction. Because the c-plane of a bismuth crystal is aligned perpendicular to the direction of a magnetic field, the temporal variation in the (110) peak intensity of bismuth was measured by X-ray diffraction to determine the crystal alignment. The alignment time decreased as the magnetic field strength increased. This tendency is similar to that calculated for the relaxation time. The difference in the magnetic susceptibility between the magnetically easy and hard axes is the driving force for the crystal alignment, and aggregation of the bismuth particles decreases this driving force. The effective difference in magnetic susceptibility for aggregated bismuth particles was estimated by measuring the alignment time of the particles under magnetic fields of various strengths. The estimated effective difference in magnetic susceptibility generally increases with a decreasing magnetic field strength. Furthermore, the interference to crystal rotation caused by the interaction between the induced current and the imposed magnetic field is negligible in this study. To decrease the strength of the magnetic field required for alignment of crystals, the number of small particles should be reduced. [doi:10.2320/matertrans.MI200719]
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影响因子：
1.8
作者：
Sugiyama, T;Tahashi, M;Asai, S
通讯作者：
Asai, S
高磁场下高羟基磷灰石c轴的取向以及模具旋转和随后的烧结过程
DOI：
--
发表时间：
2005
期刊：
Materials Transactions, JIM 46(11)
影响因子：
--
作者：
J.Akiyama,;M.Hashimoto;H.Takatama;F.Nagata;Y.Yokogawa;K.Sassa;K.Iwai;S.Asai
通讯作者：
S.Asai
高磁场下激光蒸发铋沉积膜和电阻加热法晶体取向的控制
DOI：
--
发表时间：
2003
期刊：
Materials Transactions 44・2
影响因子：
--
作者：
M.Tahashi;M.Ishihara;K.Sassa;S.Asai
通讯作者：
S.Asai
DOI：
--
发表时间：
2003
期刊：
Collected Abstracts of the 2003 Autumun Meeting of the JIM
影响因子：
--
作者：
K.SUGIURA;K.IWAI
通讯作者：
K.IWAI