Microwave-Plasma Deposition of Diamond
Microwave-Plasma Deposition of Diamond
复制标题
金刚石的微波等离子体沉积
DOI：
10.1007/978-3-642-71992-9_2
复制
发表时间：
1998
期刊：
影响因子：
--
通讯作者：
E. Sevillano
中科院分区：
文献类型：
--
作者：
E. Sevillano
Microwave-plasma enhanced chemical vapor deposition (MPECVD) is among the most widely used techniques for diamond growth from the gas phase. From its inception in the early 1980s [2.1], the technique has found a lot of success because of its simplicity, flexibility, and the early commercial availability of reactors from New Japan Radio Corporation based on the NIRIM (National Institute for Research in Inorganic Materials) work. The reactor developed at NIRIM consisted of an evacuated quartz tube which was inserted through a waveguide. A hydrogen-methane plasma was formed inside the tube and was used to create the proper gas chemistry for diamond growth. Research programs that used this technique flourished in Japan, and the first attempt at a production unit using NIRIM type reactors was made [2.2].
