Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry
Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry
复制标题
使用光谱椭偏仪、光谱反射仪和光谱成像反射仪对厚度不均匀的 SiOxCyHz 薄膜进行光学表征
DOI：
10.1016/j.tsf.2010.12.069
复制
发表时间：
2011
期刊：
影响因子：
2.1
通讯作者：
V. Buršíková
中科院分区：
文献类型：
--
作者：
I. Ohlídal;M. Ohlídal;D. Nečas;D. Franta;V. Buršíková
本文介绍了一种使我们能够对弱吸收非均匀薄膜进行完整光学表征的组合光学方法。该方法是基于标准变角光谱椭偏术，标准光谱反射术在近垂直入射和光谱成像反射术应用在垂直入射的组合。的光学常数的光谱依赖性的确定使用非成像的方法，通过使用基于参数化的电子态密度的色散模型。然后通过成像反射计确定局部厚度分布。该方法说明通过完整的光学特性的SiO{sub x}C{sub y}H{sub z}薄膜。
The combined optical method enabling us to perform the complete optical characterisation of weakly absorbing non-uniform thin films is described. This method is based on the combination of standard variable angle spectroscopic ellipsometry, standard spectroscopic reflectometry at near normal incidence and spectroscopic imaging reflectometry applied at normal incidence. The spectral dependences of the optical constants are determined using the non-imaging methods by using the dispersion model based on parametrisation of the density of electronic states. The local thickness distribution is then determined by imaging reflectometry. The method is illustrated by means of the complete optical characterisation of SiO{sub x}C{sub y}H{sub z} thin films.