Effect of basic additives on sensitivity and diffusion of acid in chemical amplification resists
Effect of basic additives on sensitivity and diffusion of acid in chemical amplification resists
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碱性添加剂对化学放大抗蚀剂中酸的敏感性和扩散的影响
DOI：
10.1117/12.210361
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发表时间：
1995
期刊：
影响因子：
--
通讯作者：
M. Nakase
中科院分区：
文献类型：
--
作者：
K. Asakawa;T. Ushirogouchi;M. Nakase
讨论了胺类添加剂在化学增幅抗蚀剂中的作用。以4-氨基苯酚和2-（4-氨基苯基）-2-（4-羟基苯基）丙烷为模型化合物，从灵敏度、扩散和分辨的角度进行了研究。等摩尔量的酸和胺在曝光后烘烤的最开始时失活，并且不能作为催化剂参与分解抑制剂。只有从失活中幸存下来的酸在抗蚀剂中扩散，从PEB的中后期分解抑制剂。碱性添加剂降低了酸的扩散范围，特别是对于长程扩散，从而在曝光区域和未曝光区域之间的界面处产生更高的对比度。此外，发现所需的胺浓度小于导致抗蚀剂灵敏度开始降低的浓度。
The effect of amine additives in chemical amplification resists is discussed. Phenolic amines such as 4-aminophenol and 2-(4-aminophenyl)-2-(4-hydroxyphenyl) propane were investigated as model compounds from the viewpoint of sensitivity, diffusion and resolution. Equal molar amounts of acid and amine deactivated at the very beginning of post-exposure bake, and could not participate in decomposing the inhibitor as a catalyst. Only the acid which survived from the deactivation diffuses in the resist, decomposing the inhibitors from the middle to late stage of PEB. The basic additives reduce the diffusion range of the acid, especially for long-range diffusion, resulting in higher contrast at the interfaces between the exposed and unexposed areas. In addition, the amine concentration required is found to be less than the concentration which causes the resist sensitivity to start decreasing.