Room-temperature wafer bonding of LiNbO3 and Si using surface activation process with self-sputtering
Room-temperature wafer bonding of LiNbO3 and Si using surface activation process with self-sputtering
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采用自溅射表面活化工艺进行 LiNbO3 和 Si 的室温晶圆键合
DOI:
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发表时间:
2020
期刊:
影响因子:
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通讯作者:
Kaname Watanabe and Ryo Takigawa
中科院分区:
文献类型:
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作者:
尾関拓海;山本大地;江川元太;吉村哲;Kaname Watanabe and Ryo Takigawa