Dynamics of electron-plasma vortex in background vorticity distribution.
Dynamics of electron-plasma vortex in background vorticity distribution.
复制标题
背景涡度分布中电子等离子体涡的动力学。
DOI：
10.1103/physrevlett.85.3173
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发表时间：
2000
影响因子：
8.6
通讯作者：
A. Mohri
中科院分区：
文献类型：
--
作者：
Y. Kiwamoto;K. Ito;A. Sanpei;A. Mohri
利用电子等离子体实验研究了点涡与宽背景涡相互作用的动力学。观察到的旋涡运动与最近提出的理论模型[D. A. Schecter和D. H. E. Dubin，Phys. Rev. Lett. 83，2191（1999）]。涡流螺旋轨道尾流中背景分布的扰动高达百分之几十，被认为是观测结果偏离线性理论模型的主要原因。
Dynamics of a point vortex in interaction with a broad profile of background vorticity is studied experimentally by using an electron plasma. The observed motion of the vortex compares favorably with a recently proposed theoretical model [D. A. Schecter and D. H. E. Dubin, Phys. Rev. Lett. 83, 2191 (1999)]. Perturbations in the background distribution in the wake of the spiral orbit of the vortex amount to several tens of percent and are considered to be a major reason for deviations of the observation from the linear theoretical model.