Nanopositioning and nanomeasuring machine NPMM-200-a new powerful tool for large-range micro- and nanotechnology
Nanopositioning and nanomeasuring machine NPMM-200-a new powerful tool for large-range micro- and nanotechnology
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DOI：
10.1088/2051-672x/4/3/034004
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发表时间：
2016-09-01
影响因子：
2.7
通讯作者：
Balzer, F.
中科院分区：
文献类型：
--
作者：
Jaeger, G.;Manske, E.;Balzer, F.
高精度计量已成为现代关键技术的使能技术。因此，在Ilmenau工业大学，开发了一种新的纳米定位和纳米测量机NPMM-200，测量范围为200 mm x 200 mm x 25 mm，分辨率为0.02 nm。该机器代表了扩展的三维阿贝比较仪原理的巨大改进，以实现纳米精度。带有测量对象的镜板的所有六个自由度由光纤耦合激光干涉仪测量，其信号然后与探针系统信号一起用于高精度位置和取向控制以及表面和坐标测量。本文介绍了该系统的概念、实现设计以及系统参数。
High-precision metrology has emerged as an enabling technology for modern key technologies. Therefore, at the Technische Universitat Ilmenau, a new nanopositioning and nanomeasuring machine NPMM-200 with a measuring range of 200 mm x 200 mm x 25 mm, and a resolution of 0.02 nm was developed. The machine represents the great improvement of the extended three-dimensional Abbe comparator principle to achieve nanometre accuracy. All six degrees of freedom of the mirror plate with the measuring object are measured by fibre-coupled laser interferometers, the signals of which are then used together with the probe system signals for a high-precision position and orientation control and surface and coordinate measurements. This paper presents the metrological concept, the realized design as well as the metrological parameters.