Effect of twin spacing on the growth velocity of Si faceted dendrites
Effect of twin spacing on the growth velocity of Si faceted dendrites
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DOI：
10.1063/1.3501974
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发表时间：
2010-10
影响因子：
4
通讯作者：
Xinbo Yang;K. Fujiwara;Raira Gotoh;K. Maeda;J. Nozawa;H. Koizumi;S. Uda
中科院分区：
文献类型：
--
作者：
Xinbo Yang;K. Fujiwara;Raira Gotoh;K. Maeda;J. Nozawa;H. Koizumi;S. Uda
通过原位观察研究了矽⟨110⟩面枝晶的生长速度作为孪晶间距的函数。当孪晶间距增加时，⟨110⟩枝晶生长速度非线性地降低。⟨110⟩和⟨112⟩的理论生长速度是根据修改的再入角模型计算的，在相同的孪生间距下，⟨112⟩的理论生长速度被发现比⟨110⟩的生长速度慢。理论的⟨110⟩枝晶生长速度与实验结果非常吻合。
The growth velocity of silicon ⟨110⟩ faceted dendrites as a function of the twin spacing was investigated by in situ observation. As the twin spacing increases, ⟨110⟩ dendrite growth velocity nonlinearly decreases. The theoretical ⟨110⟩ and ⟨112⟩ dendrite growth velocities were calculated on the basis of the modified re-entrant corner model, and the theoretical growth velocity of ⟨112⟩ dendrites was found to be slower than that of ⟨110⟩ dendrites under the same twin spacing. The theoretical ⟨110⟩ dendrite growth velocity fits quite well with the experimental results.