Periodic patterning in materials deposition by self-regulating diffusion-reaction processes
Periodic patterning in materials deposition by self-regulating diffusion-reaction processes
复制标题
通过自调节扩散反应过程在材料沉积中形成周期性图案
DOI：
10.1063/1.1574405
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发表时间：
2003
影响因子：
4
通讯作者：
M. Tsapatsis
中科院分区：
文献类型：
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作者：
M. Bhattacharya;D. Vlachos;M. Tsapatsis
提出了一种机制，并通过数值模拟验证，以解释周期性图案的材料作为一个结果，通过图灵不稳定性引起的自组织。所提出的模型包括自催化化学的活化剂-抑制剂类型，形成一个前体，然后成核和生长。影响存款图案形成和锐度的关键参数包括成核的临界浓度、生长速率和生长前体的扩散。所提出的机制为最近观察到的微孔Vycor™玻璃中形成的TiO 2带的周期性提供了可能的解释。讨论了半导体量子点、光催化材料等材料自发自组织的条件。
A mechanism is proposed and validated through numerical simulations to explain periodic patterning of materials as a result of self-organization caused via Turing instability. The proposed model includes autocatalytic chemistry of the activator–inhibitor type to form a precursor followed by nucleation and growth. Critical parameters affecting deposit pattern formation and sharpness include the critical concentration for nucleation, the growth rate, and the diffusion of the growth precursor. The proposed mechanism offers a possible explanation for the recently observed periodicity of TiO2 bands formed in microporous Vycor™ glass. Conditions for the spontaneous self-organization of materials, such as semiconductor quantum dots and photocatalytic materials, are discussed.
Liesegang 降水模式：模型和模拟
DOI：
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发表时间：
2006
期刊：
影响因子：
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作者：
通讯作者：
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