Fabrication and characterization of nanoscale resonant gratings on thin silicon membrane.
Fabrication and characterization of nanoscale resonant gratings on thin silicon membrane.
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DOI：
10.1364/oe.17.004938
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发表时间：
2009-03
期刊：
影响因子：
3.8
通讯作者：
Yongjin Wang;Y. Kanamori;Jia-sheng Ye;H. Sameshima;K. Hane
中科院分区：
文献类型：
--
作者：
Yongjin Wang;Y. Kanamori;Jia-sheng Ye;H. Sameshima;K. Hane
报道了一种可用于窄带滤波的纳米级谐振光栅的设计和制作。在绝缘体上硅片上实现了宽200 nm、高260 nm的线性/圆形光栅结构。采用电子束光刻和快原子束刻蚀相结合的方法在硅器件层上制作了纳米级的栅格。通过深反应离子刻蚀去除了栅区下方的硅把手层，并保留了埋藏的氧化层。通过反射率测量来表征制作的独立式纳米级光栅的光学响应。线性光栅的谐振行为与理论预测相符，圆光栅的偏振无关响应也得到了实验验证。
We report the design and fabrication of nanoscale resonant gratings which is of interest for narrow bandwidth filtering application. The linear/circular grating structures, of which the grating width is 200nm and the grating height is 260nm, are generated on silicon-on-insulator wafer. Nanoscale gratings are fabricated on the silicon device layer by a combination of electron beam lithography and fast atom beam etching. The silicon handle layer under grating region is removed by deep reactive ion etching, and the buried oxide layer is kept. The reflectance measurements are performed to characterize the optical response of fabricated freestanding nanoscale gratings. The resonant behavior of linear gratings agrees with the theoretical predication, and the polarization-independent responses of circular gratings are also experimentally demonstrated.