Microstructure and mechanical properties of cathodic arc ion-plated (Al, Ti)N coatings
Microstructure and mechanical properties of cathodic arc ion-plated (Al, Ti)N coatings
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DOI：
10.1016/s0257-8972(02)00610-2
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发表时间：
2003-01
影响因子：
5.4
通讯作者：
K. Sato;N. Ichimiya;A. Kondo;Y. Tanaka
中科院分区：
文献类型：
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作者：
K. Sato;N. Ichimiya;A. Kondo;Y. Tanaka
通过几个偏置电压在 WC-Co 基底上沉积阴极电弧离子镀 (Al,Ti)N 涂层。通过 X 射线衍射 (XRD) 2θ–sin2ψ 方法测量的薄膜残余应力随负偏压变化显着。分别通过电子探针微分析和透射电子显微镜研究了薄膜的成分和微观结构，并且这些也随偏压的变化而变化。成分和微观结构的变化与离子轰击引起的薄膜应变有关，并通过 XRD 谱的峰移和半值宽度进行评估。在较高偏压下，薄膜主要由尺寸为100 nm的颗粒结构组成。随着衬底负偏压的降低，微结构转变为柱状结构，柱尺寸为120 nm。与在高偏压下沉积涂层的硬质合金钻头相比，在较低偏压下沉积有(Al,Ti)N涂层的硬质合金钻头在碳钢加工中表现出更好的切削性能。钻头刃口的耐磨性对于本次测试中的钻削性能至关重要，低应变的致密柱状(Al,Ti)N薄膜显示出钻头耐磨特性的极大改善。
Cathodic arc ion-plated (Al,Ti)N coatings were deposited on WC–Co substrates by several bias voltages. The residual stress of the films, measured by the X-ray diffraction (XRD) 2θ–sin2ψ method, was found to vary significantly with the negative bias voltages. The composition and microstructure of the films were investigated by electron probe microanalysis and transmission electron microscopy, respectively, and these were also changed by the bias voltages. The changes in composition and microstructure were related to the film strains induced by ion bombardment, and were evaluated by the peak shifts and half-value widths of XRD profiles. At higher bias voltages, the films were mainly composed of granular structures with a size of 100 nm. With the decrease of negative substrate bias voltage, the microstructure changed to a columnar structure with a column size of 120 nm. Carbide drills deposited with (Al,Ti)N coating with lower bias voltages showed better cutting performance in the machining of carbon steel compared with those deposited with coating under high bias voltages. The wear resistance of drill margins is critical for the drilling performance in this test, and the dense columnar (Al,Ti)N films with low strains showed greatly improved wear-resistant characteristics of the drills.