Optimization of Key Technological Parameters in Bonnet Polishing Using FEA
Optimization of Key Technological Parameters in Bonnet Polishing Using FEA
复制标题
利用有限元分析优化阀盖抛光关键工艺参数
DOI：
10.29979/jcsme.201210.0001
复制
发表时间：
2012-10
影响因子：
0.2
通讯作者：
Zhang Dongxu
中科院分区：
文献类型：
--
作者：
Pan Ri;Wang Zhenzhong;Wang Chunjing;Guo Yinbiao;Zhang Dongxu
阀盖抛光工具以其自身的特点，广泛应用于粗抛光和精抛光。不同抛光阶段的关键工艺参数取值范围不同，这关系到关键工艺参数对抛光过程的影响。本文利用ANSYS软件对阀盖与工件表面的相互作用进行了一系列的仿真，旨在得到粗抛光和精抛光的最优关键工艺参数。研究发现，阀盖内压力、阀盖压缩高度、阀盖倾斜角和阀盖半径是影响接触面积特征的主要因素，而前两个参数直接决定了接触面积的应力贡献。最后，在仿真结果的基础上，根据不同抛光阶段的目的，对关键工艺参数的选择进行了粗略的讨论。
Bonnet polishing tool is widely used in rough polishing and fine polishing because of its own features. Ranges of key technological parameters are different in various polishing stages, which related to how the key technological parameters affect the polishing process. In this paper, series of simulations to illustrate the interaction effect of bonnet into work-piece surface using ANSYS are present, aims to get the optimal key technological parameters in rough polishing and fine polishing. It found that the inner pressure of bonnet, the height of bonnet compression, the slant angle of bonnet and bonnet radius are the main factors that influence the features of contacting area, moreover, the former two parameters directly determine the contribution of stress in contacting area. Finally, based on the simulated results, key technological parameters selected are roughly discussed according to the purpose of different polishing stages.