Ion beam analysis of H and D retention in the near surface layers of JT-60U plasma facing wall tiles
Ion beam analysis of H and D retention in the near surface layers of JT-60U plasma facing wall tiles
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DOI：
10.1016/j.jnucmat.2007.01.119
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发表时间：
2007-06
影响因子：
3.1
通讯作者：
K. Sugiyama;T. Hayashi;K. Krieger;M. Mayer;K. Masaki;N. Miya;T. Tanabe
中科院分区：
文献类型：
--
作者：
K. Sugiyama;T. Hayashi;K. Krieger;M. Mayer;K. Masaki;N. Miya;T. Tanabe
用弹性反冲探测分析方法研究了JT-60 U等离子体碳瓦近顶面的H、D滞留特性。从结果来看，H主要保留在1μm的深度内，这是因为在去除样品瓦之前进行的壁清洁的H放电。（H+D）/C比值很小：在偏滤器样品中最大值为0.07，除了在整流罩外翼瓦上的沉积物为0.13之外，在第一壁样品中最大值为0.15。再沉积碳层中的氢浓度受温度的强烈影响。因此，所观察到的低水平的（H+D）/C比是JT-60 U在300°C或更高的壁温下操作的结果。
H and D retention characteristics in the near top surface of the JT-60U plasma facing carbon tiles were investigated by means of elastic recoil detection analysis. From the result, H was dominantly retained within 1μm depth because of the H discharges for the wall cleaning carried out before the removal of sample tiles. (H+D)/C ratios were small: it was ∼0.07 at a maximum in the divertor samples except for the deposition on the dome outer wing tile which was ∼0.13, and it was ∼0.15 at a maximum in the first wall samples. The hydrogen concentration in the redeposited carbon layers is strongly influenced by the temperature. Consequently, (H+D)/C ratios at the observed low level are a result of the operation of JT-60U at wall temperatures of 300°C or higher.