On the phase formation of titanium oxide thin films deposited by reactive DC magnetron sputtering: influence of oxygen partial pressure and nitrogen doping
On the phase formation of titanium oxide thin films deposited by reactive DC magnetron sputtering: influence of oxygen partial pressure and nitrogen doping
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反应直流磁控溅射沉积氧化钛薄膜的相形成：氧分压和氮掺杂的影响
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发表时间：
2014
期刊：
影响因子：
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通讯作者：
A. Tyagi
中科院分区：
文献类型：
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作者：
R. Pandian;G. Natarajan;S. Rajagopalan;M. Kamruddin;A. Tyagi
本文研究了反应直流磁控溅射法制备的氧化钛薄膜的相形成控制。通过控制溅射过程中的氧分压，制备了不同物相的二氧化钛薄膜。通过在氧气和Ar混合气体中加入氮气，氧分压进一步降低到通常的临界值以下，在该临界值以下和高于临界值时，溅射分别产生金属膜和氧化膜。此外，氮气的加入消除了流量与氧分压之间典型的滞后行为，并显著影响了溅射速率。随着氧分压的增加，锐钛矿与金红石的比例增大，晶粒度增大。断口扫描电子显微镜结合X射线衍射和显微拉曼光谱的补充信息，揭示了锐钛矿相和金红石相的演化和空间分布。提供给生长薄膜的能量和氧空位浓度都与不同氧分压下不同相的形成有关。
This work describes about the control on phase formation in titanium oxide thin films deposited by reactive dc magnetron sputtering. Various phases of titanium oxide thin films were deposited by controlling the oxygen partial pressure during the sputtering process. By adding nitrogen gas to sputter gas mixture of oxygen and argon, the oxygen partial pressure was decreased further below the usual critical value, below and above which the sputtering yields metallic and oxide films, respectively. Furthermore, nitrogen addition eliminated the typical hysteretic behaviour between the flow rate and oxygen partial pressure, and significantly influenced the sputter rate. On increasing the oxygen partial pressure, the ratio between anatase and rutile fraction and grain size increases. The fracture cross-sectional scanning electron microscopy together with the complementary information from X-ray diffraction and micro-Raman investigations revealed the evolution and spatial distribution of the anatase and rutile phases. Both the energy delivered to the growing film and oxygen vacancy concentrations are correlated with the formation of various phases upon varying the oxygen partial pressure.