In Situ Fabrication of Highly Conductive Metal Nanowire Networks with High Transmittance from Deep-Ultraviolet to Near-Infrared
In Situ Fabrication of Highly Conductive Metal Nanowire Networks with High Transmittance from Deep-Ultraviolet to Near-Infrared
复制标题
原位制造具有从深紫外到近红外高透过率的高导电金属纳米线网络
DOI：
10.1021/nn504932e
复制
发表时间：
2015-03-01
期刊：
影响因子：
17.1
通讯作者：
Zou, Zhigang
中科院分区：
文献类型：
--
作者：
Bao, Chunxiong;Yang, Jie;Zou, Zhigang
我们开发了一种简便且兼容的方法，可以在基板上原位制造均匀的金属纳米线网络。所制造的金属纳米线网络表现出低方块电阻和高透射率（2.2 Omega sq(-1) at T=91.1%），这与最先进的金属纳米线网络相当。我们证明，当线间距尺寸增加到微米尺寸时，金属网络的透射率从深紫外（200 nm）到近红外（2000 nm）变得均匀。理论和实验：分析表明，我们可以通过增加金属薄膜的厚度来提高金属网络的电导率并保持其透射率。我们还进行了耐久性测试，以证明我们制造的金属网络具有良好的柔韧性和强附着力。
We have developed a facile and compatible method to in situ fabricate uniform metal nanowire networks on substrates. the as-fabricated metal nanowire networks show low sheet resistance and high transmittance (2.2 Omega sq(-1) at T=91.1%), which is equivalent to that Of the state-of-the-art metal nanowire networks. We demonstrated that the transmittance of :the metal networks becomes homogeneous from deep-ultraviolet (200 nm) to near-infrared (2000 nm) when the size of the wire spacing increases to micrometer size. Theoretical and experimental: analyses indicated that we can improve the conductivity of the metal networks as well as keep their transmittance by increasing the thickness of the metal films. We also carried out durability tests to demonstrate our as-fabricated metal networks having good flexibility and strong adhesion.