Electron field emission from amorphous tetrahedrally bonded carbon films
Electron field emission from amorphous tetrahedrally bonded carbon films
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非晶四面体键合碳膜的电子场发射
DOI：
10.1116/1.580326
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发表时间：
1996
期刊：
影响因子：
--
通讯作者：
M. Siegal
中科院分区：
文献类型：
--
作者：
A. Talin;T. Felter;T. Friedmann;J. Sullivan;M. Siegal
使用具有微米空间分辨率的扫描探针装置研究了通过脉冲激光沉积制备的两种非晶、四面体键合的类金刚石碳膜的电子场发射，其中一种具有（a-tC：N），另一种不含氮掺杂（a-tC）。我们的a-tC：N（a-tC）薄膜需要100 V/μm（180 V/μm）的电场来引发发射;然而，一旦在特定位置建立了发射，电子就可以在低至10 V/μm（60 V/μm）的平均电场下从同一区域被吸引。发射的开始伴随着通过视频技术观察到的放电。这些放电在原本光滑的薄膜表面上留下了微米尺寸的凹坑。
Electron field emission from two amorphous, tetrahedrally bonded diamondlike carbon films, one with (a‐tC:N), and a second without nitrogen doping (a‐tC), prepared by pulsed laser deposition has been investigated using a scanning probe apparatus with micrometer spatial resolution. Electric fields of 100 V/μm (180 V/μm) were required to initiate emission from our a‐tC:N (a‐tC) films; however, once emission was established at a particular location, electrons could be drawn at average fields as low as 10 V/μm (60 V/μm) from the same region. The initiation of emission was concomitant with electrical discharges which were observed by video techniques. These discharges left craters with micrometer dimensions on the surfaces of otherwise smooth films.