Ion beams and their applications in high-resolution probe formation
Ion beams and their applications in high-resolution probe formation
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DOI：
10.1109/tps.2005.860086
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发表时间：
2005-12
影响因子：
1.5
通讯作者：
S. Guharay;J. Orloff;M. Wada
中科院分区：
文献类型：
--
作者：
S. Guharay;J. Orloff;M. Wada
对高亮度离子束最关键的需求来自聚焦离子束的工业应用领域，液态金属离子源技术可以满足这一需求。液态金属离子源虽然被认为是一种成功的技术，但由于束流种类的限制，存在很大的局限性。光束亮度与液态金属离子源相当的无污染离子束品种，即/spl sim/10/sup 6/ A cm/sup -2/ sr/sup -1/和能量传播为/spl sim/1 eV，将是许多尖端应用的理想选择，包括离子束铣削，掩模修复和成像研究。本文试图提出高分辨率探头成形光束发展的要点。考虑到这一具体目标，本研究基于对点源的分析，然后在“广泛”源（主要是等离子体源）的一般分类下讨论各种其他源。这一类别中的几种光源，包括penning型光源、multicusp光源和新一代高电荷态光源，似乎具有绕过液态金属离子源限制的优点，尽管需要进一步研究以提高光束亮度并推进当前的技术水平。
The most critical demand for high-brightness ion beams emerged from the realm of industrial applications of focused ion beams and it was met by using liquid metal ion source technology. Although recognized as a successful technology, liquid metal ion sources have major limitations in view of beam species. Noncontaminating ion beam species with beam brightness comparable to liquid metal ion source, i.e., /spl sim/10/sup 6/ A cm/sup -2/ sr/sup -1/ and energy spread of /spl sim/1 eV will be ideal for many cutting-edge applications including ion beam milling, mask repair, and imaging studies. This paper attempts to bring out the essential points in the development of high-resolution probe forming beams. With this specific objective in view, this study is based on an analysis of point sources and then a variety of other sources, under the general classification of "broad" source (primarily plasma sources), are discussed. Several sources in this category including a Penning-type source, a multicusp source, and new-generation high-charged state sources seem to have merits for circumventing the limitations of liquid metal ion sources, although further research is needed to improve the beam brightness and advance the state-of-the art.