A Study on Reclaimed Photoresist Developer Using an Electrodialysis Method
A Study on Reclaimed Photoresist Developer Using an Electrodialysis Method
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电渗析法回收光刻胶显影剂的研究
DOI：
10.1143/jjap.41.2374
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发表时间：
2001
期刊：
影响因子：
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通讯作者：
T. Ohmi
中科院分区：
文献类型：
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作者：
H. Sugawara;Y. Tajima;T. Ohmi
研究了光致抗蚀剂显影剂回收技术和体系，并对回收后显影剂的性能进行了评价。在大规模集成电路(LSI)和液晶显示器(LCD)制造工艺的光刻步骤中，通常使用调节到适当浓度的高纯度四甲基氢氧化铵(TMAH)水溶液作为光刻胶显影剂。用电渗析(ED)法从显影剂废液中回收TMAH，并用离子交换(IE)技术进行纯化。对回收的显影剂进行分析，发现其纯度与新鲜的商业显影剂相同，并且无法确定它们与显影剂原料的特性差异。我们的实验回收系统从废物中回收了80%以上的稳定的TMAH，而且大大降低了运营成本，与我们研究的没有回收的传统系统相比，大规模集成电路的总成本降低了55%-75%，LCD的总成本降低了65%-85%。此外，还减少了环境负荷。
Photoresist developer reclamation technology and systems have been investigated and characteristics of the reclaimed developer were evaluated. High-purity tetramethylammonium hydroxide (TMAH) aqueous solution adjusted to an appropriate concentration is generally used as the photoresist developer in the lithography step for large scale integration (LSI) and liquid crystal display (LCD) manufacturing processes. TMAH was recovered by an electrodialysis (ED) method from developer waste (spent developer), and purified by ion exchange (IE) technologies. The reclaimed developer was analyzed and found to feature the same purity as fresh commercial developer and no differences in their characteristics as developer material could be determined. Our experimental reclamation system recovered more than 80% of stable TMAH from waste and, moreover, achieved large reductions in operating costs, which amounted to total cost reductions of 55–75% for LSI and 65–85% for LCD compared with the conventional systems without reclamation studied by us. In addition, environmental load was reduced.