Laplace- and diffusion-field-controlled growth in electrochemical deposition.
Laplace- and diffusion-field-controlled growth in electrochemical deposition.
复制标题
电化学沉积中拉普拉斯场和扩散场控制的生长。
DOI：
10.1103/physrevlett.62.2703
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发表时间：
1989
影响因子：
8.6
通讯作者：
Zamir
中科院分区：
文献类型：
--
作者：
Garik;Barkey;Ben;Bochner;Broxholm;Miller;Orr;Zamir
我们区分了拉普拉斯场和扩散场在密集分枝形貌生长过程中的电化学沉积过程中的作用。生长的形状由拉普拉斯场控制，微观形貌以扩散场控制生长为特征，分支尺寸长度尺度假设为两场相互作用的结果。支化速率随系统参数而变化，从而选择明显恒定的界面速度
We distinguish the roles of the Laplace and diffusion fields in electrochemical deposition during growth of the dense-branching morphology. The shape of the growth is controlled by the Laplace field; the microscopic morphology is characteristic of diffusion-field-controlled growth; and the branch size length scale is hypothesized to be the result of the interplay of the two fields. The branching rate varies with system parameters so as to select an apparently constant interfacial velocity