A Negative-Working Alkaline Developable Photoresist Based on Calix[4]resorcinarene, a Cross-linker, and a Photoacid Generator
A Negative-Working Alkaline Developable Photoresist Based on Calix[4]resorcinarene, a Cross-linker, and a Photoacid Generator
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基于Calix[4]间苯二酚、交联剂和光致产酸剂的负性碱性可显影光刻胶
DOI：
10.1246/cl.1997.265
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发表时间：
1997
影响因子：
1.6
通讯作者：
M. Ueda
中科院分区：
文献类型：
--
作者：
Tomonari Nakayama;Kohji Haga;Osamu Haba;M. Ueda
以杯[4]间苯二酚为基团，4，4′-methylenebis[2，6-bis(hydroxymethyl)phenol](MBHP)为交联剂，二苯基碘并9，10-二甲氧基菲-2-磺酸(DIAS)为光敏剂，研制了负性工作光致抗蚀剂。在365 nm紫外光照射下，在130°C下烘烤，然后用0.5%的四甲基氢氧化铵水溶液在室温下显影，得到了清晰的负图。
A negative working photoresist based on calix[4]resorcinarene, 4,4′-methylenebis[2,6-bis(hydroxymethyl)phenol] (MBHP) as a cross-linker, and a photoacid generator, diphenyliodonium 9,10-dimethoxyanthracene-2-sulfonate (DIAS), has been developed. A clear negative pattern was obtained when it was exposed to 365 nm UV light and postbaked at 130 °C, followed by developing with a 0.5% aqueous tetramethylammonium hydroxide solution at room temperature.