Feasibility of ZnO:Al/Ag/ZnO:Al multilayer source/drain electrode to achieve fully transparent HfInZnO thin film transistor

Feasibility of ZnO:Al/Ag/ZnO:Al multilayer source/drain electrode to achieve fully transparent HfInZnO thin film transistor
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DOI:
10.1016/j.tsf.2015.11.018
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发表时间:
2016-04
期刊:
影响因子:
2.1
通讯作者:
Jun Li;Jianhua Zhang;Xueyin Jiang;Zhilin Zhang
Jun Li;Jianhua Zhang;Xueyin Jiang;Zhilin Zhang
中科院分区:
材料科学3区
文献类型:
--
作者:
Jun Li;Jianhua Zhang;Xueyin Jiang;Zhilin Zhang

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