Formation of hydrated yttrium oxide and titanium oxide thin films by reactive sputtering in H2O atmosphere and their electrical properties
Formation of hydrated yttrium oxide and titanium oxide thin films by reactive sputtering in H2O atmosphere and their electrical properties
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DOI：
10.7567/jjap.53.068002
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发表时间：
2014-06
影响因子：
1.5
通讯作者：
Y. Abe;Ning Li;K. Nishimoto;M. Kawamura;K. Kim;Tsutomu Suzuki
中科院分区：
文献类型：
--
作者：
Y. Abe;Ning Li;K. Nishimoto;M. Kawamura;K. Kim;Tsutomu Suzuki
水合氧化钇和氧化钛薄膜是通过反应溅射在H2O气氛中在衬底温度从−30到+130 °C制备的。氧化钇薄膜的电导率随衬底温度的降低而增加。电导率的增加对应于由于OH键的IR吸收强度的增加，并且认为质子传导在氧化钇膜中占主导地位。相反，二氧化钛薄膜的电导率随着衬底温度的增加而增加，这表明电子传导在薄膜中占主导地位。
Hydrated yttrium oxide and titanium oxide thin films were prepared by reactive sputtering in H2O atmosphere at substrate temperatures from −30 to +130 °C. The electrical conductivities of the yttrium oxide films increased with decreasing substrate temperature. The increase in electrical conductivity corresponds well to the increase in IR absorption intensity due to OH bonds, and it is considered that proton conduction is dominant in the yttrium oxide films. In contrast, the conductivity of the titanium oxide films increased with increasing substrate temperature, suggesting that electron conduction is dominant in the films.