Evaluation of Chemical Gradient Enhancement Methods for Chemically Amplified Extreme Ultraviolet Resists
Evaluation of Chemical Gradient Enhancement Methods for Chemically Amplified Extreme Ultraviolet Resists
复制标题
化学放大极紫外光刻胶化学梯度增强方法的评价
DOI：
10.1143/jjap.48.126004
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发表时间：
2009
期刊：
影响因子：
--
通讯作者：
and S. Tagawa
中科院分区：
文献类型：
--
作者：
T. Kozawa;H. Oizumi;T. Itani;and S. Tagawa
分辨率、灵敏度和线边缘粗糙度（LER）之间的权衡关系是极紫外（EUV）光刻胶开发中最严重的问题。尽管灵敏度和分辨率已经接近满足22 nm节点的要求，但LER仍距离目标值很远。减少 LER 需要增强潜像中的化学梯度。在这项研究中，评估了化学梯度增强方法的效果。我们研究了聚合物吸收增强、产酸剂浓度增加和耀斑减少。其中，聚合物吸收增强对于化学梯度增强最为有效。
The trade-off relationships between resolution, sensitivity, and line edge roughness (LER) are the most serious problems in the development of extreme ultraviolet (EUV) resists. Although the sensitivity and resolution have become close to meeting the requirements for the 22 nm node, LER is still far from the targeted value. The enhancement of the chemical gradient in latent images is required for the reduction of LER. In this study, the effects of chemical gradient enhancement methods were evaluated. We examined polymer absorption enhancement, acid generator concentration increase, and flare reduction. Among them, polymer absorption enhancement was the most effective for chemical gradient enhancement.