Rutherford Scattering of Protons in the Surface Layers of a Tungsten Single Crystal
Rutherford Scattering of Protons in the Surface Layers of a Tungsten Single Crystal
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钨单晶表面层质子的卢瑟福散射
DOI：
10.1103/physrevlett.19.61
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发表时间：
1967
影响因子：
8.6
通讯作者：
E. Bøgh
中科院分区：
文献类型：
--
作者：
E. Bøgh
分别为粒子和晶体原子的原子序数，e为电子电荷，E为粒子能量，d为原子在粒子进入晶体时所平行的晶轴上的重复距离。Ge通常为1 ′的量级。到目前为止，除了少数例外，观察到的最低产率都比理想晶体的理论估计高2-10倍，这取决于靶材料。理论估计是基于这样的假设，即只有那些在-in-a [在费米原子势中的屏蔽距离，a= 0]内撞击晶体表面的外束粒子。46（Z，
are the atomic numbers of the particle and the crystal atoms, respectively, e is the electron-ic charge; E is the particle energy,'and d is the repetition distance of the atoms in the crys-tal axis parallel to which the particles entered the crystal. ge is typically of the order of 1'. The minimum yields observed hitherto, have, with few exceptions, been higher than the the-oretical estimate for a perfect crystal by a factor of 2-10 depending on the target material. The theoretical estimate is based on the assumption that only those particles in the exterior beam which hit the crystal surface with-in-a [the screening distance in the Thomas-Fermi atomicpotential, a= 0. 46 (Z,